Chromium-based attenuated embedded shifter preproduction

F. D. Kalk, R. H. French, A HHUG.  1994.  

Abstract:

Attenuated embedded phase shifting photomask technology can improve lithography performance for both g-line and i-line steppers. Emphasis at i-line is shifting from development to production as lithographers integrate phase shifting masks into their processes. This paper describes pilot production of i-line and g-line, Cr-based, attenuated embedded phase shifter photoblanks and photomasks.

Conference Name:

Proceedings of {SPIE}

Conference Location:

Santa Clara, {CA}, {USA}

URL:

http://link.aip.org/link/?PSI/2322/299/1&Agg=doi

DOI:

10.1117/12.195825